Consulting photolithography - MB WHITAKER & Associates

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MB Whitaker & Associates
MB Whitaker & Associates
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Consulting photolithography

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We support you in solving lithographic problems

Surface tension, adhesion and wetting of materials for photolithographic process
Surface Tension and Adhesion of Photo and Electron-Beam Resists
Optimization of anti-reflective coatings for lithography applications:

Optical Proximity Correction for 0.13┬Ám SiGe:C BiCMOS:

100nm Half-Pitch Double Exposure KrF Lithography Using Binary Masks:

Deep-UV KrF Lithography for the Fabrication of Bragg Gratings on SOI Rib Waveguides:

Lithographic aspects for the fabrication of BiCMOS embedded Bio-MEMS and RF-MEMS:
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